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Plasma Chemistry and Plasma Processing EI CA AJ SCIE JST JCR:Q3 中科院3区 JCR:Q2
发文量 2,462
被引量 56,495
影响因子(2023) 2.989

Plasma Chemistry and Plasma Processing is an international journal that provides a forum for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The journal encompasses all types of industrial processing plasmas, ranging from nonthermal plasmas to thermal plasmas, and publishes fundamental plasma studies as well as studies of specific plasma applications. Application contexts of interest include plasma etching in microelectronics and other fields, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and others. Includes studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces. Please note, we are working with a new submission system. In case you have questions regarding a submission made before February 2023, please access the system via the link provided to you in the submission confirmation email. We are currently preparing a special issue on Dielectric-Barrier Discharges and their Applications in commemoration of the 20th anniversary of Kogelschatz’s work. Found out more here. An international forum for fundamental research and new developments in plasma chemistry and plasma processing Offers fundamental plasma studies and studies of specific applications Covers plasma etching in microelectronics, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and more 96% of authors who answered a survey reported that they would definitely publish or probably publish in the journal again

  • 主办单位： SPRINGER
  • 出版地区： United States
  • 出版周期： 双月刊
  • 别名： 等离子体化学与等离子体处理
  • 国际标准连续出版物号： ISSN 0272-4324
  • 创刊时间： 1981年
热门主题：

PlasmaDischargeExperimentalDielectric Barrier DischargeTemperatureFormationPLASMASDecompositionAtmospheric PressureSynthesisTreatmentThermal PlasmaEffectsDISCHARGESModelingInfluenceConcentrationWaterReactorDeposition

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2025年02期
共：9篇

      不详

    • Zampieri, LeonardoIbba, LorenzoAgus, RitaFurno, IvoZuin, MatteoDe Masi, GianlucaCordaro, LuigiCavazzana, RobertoMartines, Emilio

      485-501

    • Ghaderi, NasserHasheminejad, NavidGolmohammadi, AliRibbens, BartDirckx, JorisVanlanduit, Steve

      503-514

    • Shi, JiaqiYan, XueqingHua, WeiChang, YingChang, Guang

      515-534

    • Marji, SaifZaldivar, Gabriela BaezGirardLauriault, PierreLuc

      535-550

    • Nitsche, TimLohmann, HeikoBudt, Marcus

      551-567

    • Rathore, VikasNagar, AtulPatel, ShrutiPandey, AkankshaPatil, Chirayu N.Savjani, JignasaButani, ShitalNatesan, GopalDave, HemanNisoa, MudtorlepNema, Sudhir Kumar

      569-595

    • Milardovich, N. J.Santamaria, B.Fina, B. L.Chamorro, J. C.Fischfeld, G.Prevosto, L.

      597-618

    • Sadeghi, H.Kiai, S. M. SadatFazelpour, SamanehShirmardi, S. P.Fathi, Shahriar

      619-637

    • Cameli, FabioStefanidis, Georgios D.

      639-658
2025年02期

2025年02期

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