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Journal of Applied Physics EI CA AJ SCIE 中科院3区 JCR:Q2
发文量 179,309
被引量 4,190,593
影响因子(2023) 2.397

The Journal of Applied Physics (JAP) is an influential international journal publishing significant new experimental and theoretical results of applied physics research. Topics covered in JAP are diverse and reflect the most current applied physics research, including: Dielectrics, ferroelectrics, and multiferroics- Electrical discharges, plasmas, and plasma-surface interactions- Emerging, interdisciplinary, and other fields of applied physics- Magnetism, spintronics, and superconductivity- Organic-Inorganic systems, including organic electronics- Photonics, plasmonics, photovoltaics, lasers, optical materials, and phenomena- Physics of devices and sensors- Physics of materials, including electrical, thermal, mechanical and other properties- Physics of matter under extreme conditions- Physics of nanoscale and low-dimensional systems, including atomic and quantum phenomena- Physics of semiconductors- Soft matter, fluids, and biophysics- Thin films, interfaces, and surfaces

  • 主办单位： AIP PUBLISHING
  • 出版地区： United States
  • 出版周期： 周刊
  • 别名： 应用物理学杂志
  • 国际标准连续出版物号： ISSN 0021-8979
  • 创刊时间： 1929年
  • 曾用名： Physics
热门主题：

ExperimentalFILMSMagneticTemperatureEffectsThin FilmsFormationSiliconPresentsStructureEnergyThicknessGrowthPropertiesDegreesStructuresSignificantthe EffectInterfaceApplication

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封面
2024年24期
共：33篇

      不详

    • Ball, J.E.Wild, J.M.Norquay, G.

    • Pal, S.Pal, P. K.Fabiha, R.Bandyopadhyay, S.Barman, A.

    • Wang, KeKimura, ShinichiYamauchi, KunihikoYamahara, HiroyasuMurakami, HironaruSeki, MunetoshiOguchi, TamioTabata, HitoshiTonouchi, Masayoshi

    • Park, SuehyunKim, RaseongYoung, Ian A.

    • Newell, A.T.Carrasco, R.A.Hains, C.P.Logan, J.V.Balakrishnan, G.Maestas, D.Morath, C.P.Webster, P.T.

    • Petit, LionelBlon, ThomasLassagne, Benjamin

    • Fang, JingzhongLi, RunYao, SonglinChen, JunWang, Kun

    • Le Bras, C.Berthe, L.Videau, L.Baton, S.Boustie, M.Boyer, S.Rousseaux, C.Brambrink, E.Chevalier, J. m.Boutoux, G.Houy, J.Aubert, B.Jodar, B.Loison, D.Hebert, D.

    • Lu, YiZhou, JieKhandelwal, VishalAdamo, CarolinaMarshall, PatrickGong, JiaruiLiu, YangNg, Tien KheeLi, XiaohangOoi, Boon S.Gambin, VincentMa, Zhenqiang

    • Nakata, Jyoji

    • Mondal, SumitSingh, JaspreetKanchana, V.

    • Wolter, StefanAgluschewitsch, VladislavWolter, SilkeLuessmann, FrederikMargenfeld, ChristophSchoettler, GeorgHartmann, JanaWaag, Andreas

    • Hao, TengyuanHossain, Zubaer M.

    • Fu, HaodongLi, QiZhai, DongyuanWang, YuweiLu, Jiwu

    • Nichelatti, E.Piccinini, M.Ampollini, A.Astorino, M. D.Bazzano, G.Nenzi, P.Surrenti, V.Trinca, E.Ronsivalle, C.

    • Schifano, R.Gieraltowska, S.Kurek, J.Wachnicki, L.Rehman, U.Budiakivska, D.Chusnutdinow, S.Kopalko, K.Porro, S.Jakiela, R.Minikayev, R.Witkowski, B. S.Pawlowski, M.Jastrzebski, C.Thogersen, A.

    • Yan, ZimingLu, RanranDing, LinfengWang, LianjunZhang, Zhen

    • Abram, EsterOrlov, NikolaiGarnett, Erik C.Planken, Paul

    • Yang, SenLan, YuxuanLi, GaomingPeng, BoGuo, Hui

    • IJpes, D.Yakshin, A.E.Ackermann, M.D.

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2024年24期

2024年24期

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