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Parameter ExtractionReactive Ion EtchingSeries ResistanceLeakage Drain CurrentAsynchronous Sequential LogicCMOS TechnologyAsynchronous Sequential CircuitsThreshold VoltageTemperature RangePlanar Spiral InductorsTwo-dimensional Mathematical ModelThree Dimensional EffectsDesign of Experiment ApproachParallel Signal ProcessingResistance ExtractionDeep Trench EtchingConductance ModelsInterconnection TechnologyHamming NetworkReverse Breakdown Voltage
vol.6 (1998)
vol.5 (1997)
vol.4 (1996)